Tantalum sputtering target,Tantalum alloy target
Material: RO5200, RO5400, RO5252(Ta-2.5W), RO5255(Ta-10W)
Size:
Tantalum sputtering target,Tantalum alloy target
Material: RO5200, RO5400, RO5252(Ta-2.5W), RO5255(Ta-10W)
Size:
circular targets: Diameter 25mm up to 400mm x Thickness 3mm up to 28mm
rectangular targets: Thickness 1mm up to 12.7mm x Width up to 600mm
x Length up to 2000mm
Purity: >=99.95% or 99.99%
Table 1: technology parameter
Grade | 3N, 3N5, 4N, with Ta 99.99%min |
Recrystallization | 95%min |
Grain size | ASTM 4 or finer |
Surface finish | 16Rms max. or Ra 0.4 ( RMS64 or better) |
Flatness | 0.1mm or 0.15% max |
Tolerance | +/-0.010" on all dimensions |
Table 2. Chemical composition:
Chemistry % | |||||||||||||
Designation | Chief component | Impurities maxmium | |||||||||||
Ta | Nb | Fe | Si | Ni | W | Mo | Ti | Nb | O | C | H | N | |
Ta1 | Remainder | 0.004 | 0.003 | 0.002 | 0.004 | 0.004 | 0.002 | 0.03 | 0.015 | 0.004 | 0.0015 | 0.002 | |
Ta2 | Remainder | 0.01 | 0.01 | 0.005 | 0.02 | 0.02 | 0.005 | 0.08 | 0.02 | 0.01 | 0.0015 | 0.01 | |
TaNb3 | Remainder | 3.5 | 0.01 | 0.01 | 0.005 | 0.02 | 0.02 | 0.005 | 0.02 | 0.01 | 0.0015 | 0.01 | |
TaNb20 | Remainder | 17.023.0 | 0.01 | 0.01 | 0.005 | 0.02 | 0.02 | 0.005 | 0.02 | 0.01 | 0.0015 | 0.01 | |
Ta2.5W | Remainder | 0.005 | 0.003 | 0.002 | 3.0 | 0.006 | 0.002 | 0.04 | 0.015 | 0.005 | 0.0015 | 0.006 | |
Ta10W | Remainder | 0.005 | 0.003 | 0.002 | 11 | 0.006 | 0.002 | 0.04 | 0.015 | 0.005 | 0.0015 | 0.006 | |
