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Aluminum Sputtering Target Experiment Research
Aluminum Sputtering Target Experiment Research

Model No: Al-t

Metal Aluminum(AL) Density 2.7g/cm3 Melting point 660.37℃ Boiling point 2327℃ Atomic number 13 Purity 99.9% , 99.99%, 99.999%, 99.9999% Color Silvery white Tolerance +/-0.2mm CAS 7429-90-5 Size Size 01: diameter 1 mm (wafer / round table / rod) Size 02: length 1 mm length> 1 mm (pipe / ring / rotatable targets) Size 04:be customized according to user needs, sample processing, to map processing Grain size Uniform Production process Vacuum levitation melting, casting into ingots, thermo-mechanical treatment and precision machining Applicable instruments Various models magnetron sputtering equipment, etc. Shape Rotundity/rectangle/pieces/rod/ring /revolving targets/by drawing Product uses Industrial-grade coating, experiments or research level Mg target, electronics, optoelectronics, military, decorative, functional film Packing vacuum Packaging / vacuum neutral packing / special packaging outside reinforcement package Origin Nanchang Jiangxi Brand MAT-CN

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